1. EUV lithography at chipmakers has started: Performance validation of ASML's NXE:3100 / C. Wagner, J. Bacelar, N. Harned et al. // Proc. SPIE. Extreme Ultraviolet (EUV) Lithography II. 2011. Vol. 7969. Art. ID: 79691F. DOI: 10.1117/12.878603
2. Application of synchrotron radiation to X-ray lithography / E. Spiller, D. E. Eastman, R. Feder et al. //j. Appl. Phys. 1976. Vol. 47. P. 5450-5459. DOI: 10.1063/1.322577 EDN: NSBZJD
3. Haelbich R. P., Silverman J. P., Warlaumont J. M. Synchrotron radiation X-ray lithography // Nucl. Instr. Meth. Phys. Res. 1984. Vol. 222. Iss. 1-2. P. 291-301. DOI: 10.1016/0167-5087(84)90547-7
4. Naulleau P. EUV lithography // Synchrotron Radiat. News. 2019. Vol. 32. Iss. 4. Art. No. 2. DOI: 10.1080/08940886.2019.1634429
5. Present status of the synchrotron radiation facility NewSUBARU / S. Hashimoto, Y. Shoji, Y. Fukuda et al. // PACS2001. Proceedings of the 2001 Particle Accelerator Conference (Cat. No. 01CH37268). Chicago, IL: IEEE, 2001. P. 2692-2694. DOI: 10.1109/PAC.2001.987875
6. Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU / T. Harada, J. Kishimoto, T. Watanabe et al. //j. Vac. Sci. Technol. B. 2009. Vol. 27. Iss. 6. P. 3203-3207. DOI: 10.1116/1.3258633
7. Watanabe T., Harada T. Research activities of extreme ultraviolet lithography at the University of Hyogo // Synchrotron Radiat. News. 2019. Vol. 32. Iss. 4. P. 28-35. DOI: 10.1080/08940886.2019.1634435
8. EUV interference lithography for 1X nm / T. Urayama, T. Watanabe, Y. Yamaguchi et al. //j. Photopolym. Sci. Technol. 2011. Vol. 24. Iss. 2. P. 153-157. DOI: 10.2494/photopolymer.24.153
9. Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic / P. Naulleau, K. A. Goldberg, E. H. Anderson et al. // Proc. SPIE. Emerging Lithographic Technologies VIII. 2004. Vol. 5374. Art. ID: 556538. DOI: 10.1117/12.556538
10. Chang C., Robinson A. Quantitative measurements of undulator spatial coherence at the ALS // Synchrotron Radiat. News. 2001. Vol. 14. Iss. 2. P. 32-33. DOI: 10.1080/08940880108261135
11. Ковальчук М. В., Нарайкин О. С., Занавескин М. Л. Технологический накопительный комплекс "Зеленоград" как основа создания инжинирингового центра перспективных материалов, микроэлектроники и биомедицинских технологий // Кристаллография. 2022. Т. 67. № 5. С. 766-770. -. DOI: 10.31857/S0023476122050149 EDN: QBQMSW
Kovalchuk M. V., Naraikin O. S., Zanaveskin M. L. Technical storage ring complex “Zelenograd” as a base for an engineering center of advanced materials, microelectronics, and biomedical technologies. Crystallogr. Rep., 2022, vol. 67, pp. 712–716.
https://doi.org/10.1134/S1063774522050145
12. TNK - synchrotron radiation source for submicron technology applications / V. V. Anashin, E. I. Gorniker, N. G. Gavrilov et al. // Nucl. Instr. Meth. Phys. Res. A. 1991. Vol. 308. Iss. 1-2. P. 45-49. DOI: 10.1016/0168-9002(91)90584-D EDN: XLLEWW
13. Beam lines at the TNK SR source / V. V. Anashin, L. G. Isaeva, E. P. Kollerov et al. // Nucl. Instr. Meth. Phys. Res. A. 1991. Vol. 308. Iss. 1-2. P. 50-53. DOI: 10.1016/0168-9002(91)90585-E EDN: XKLGNM
14. Multipole wiggler and undulator for the TNK SR source / G. I. Erg, V. N. Korchuganov, G. N. Kulipanov et al. // Nucl. Instr. Meth. Phys. Res. A. 1991. Vol. 308. Iss. 1-2. P. 57-60. DOI: 10.1016/0168-9002(91)90587-G EDN: XKSJHT
15. Status of the ‘‘Zelenograd'' storage ring / O. Anchugov, V. Arbuzov, O. Belikov et al. // Nucl. Instr. Meth. Phys. Res. A. 2009. Vol. 603. Iss. 1-2. P. 4-6. DOI: 10.1016/j.nima.2008.12.111 EDN: LLSAXL
16. Halbach K. Physical and optical properties of rare earth cobalt magnets // Nucl. Instr. Meth. Phys. Res. 1981. Vol. 187. Iss. 1. P. 109-117. DOI: 10.1016/0029-554X(81)90477-8